Application of hafnium silicide in material preparation

Overview of hafnium silicide HfSi2 powder

Hafnium silicide is a transition metal silicide, a refractory intermetallic compound.

Due to its unique physical and chemical properties, hafnium silicide has been successfully used in CMOS devices, thin-film coatings, box structures, electric heating elements, thermoelectric materials and photovoltaic materials.

In addition, hafnium nanomaterials have special electrical, optical, magnetic and thermoelectric properties, and have potential application value in the field of catalysis.

Our silicide ha products have the characteristics of high purity, small particle size, uniform distribution, large specific surface area, and high surface activity.

Silicidation is most commonly used in ceramic materials to manufacture various high-temperature parts and functional parts.

Its nanomaterials show special electrical, optical, magnetic and thermoelectric properties, and even have potential application value in the field of catalysis. However, traditional metallurgical methods or physical methods and other preparation methods cannot satisfy the preparation of transition metal silicide nanomaterials. Therefore, finding a simple, controllable and universal preparation method is of great significance for the wide application of transition metal silicide nanomaterials.

Application of hafnium silicide HfSi2 powder

Hafnium silicide is a transition metal silicide, a refractory intermetallic compound.

Due to its unique physical and chemical properties, silicide has been successfully used in CMOS devices,

Thin film coatings, block structures, electric heating elements, thermoelectric materials and photovoltaic materials, etc.

In addition, silicide ha nanomaterials also have special electrical and optical properties, magnetoelectric and thermoelectric properties, and have potential applications in the field of catalysis.

Our silicide ha products have the characteristics of high purity, small particle size, uniform distribution, large specific surface area, and high surface activity.

Silicidation is most commonly used in ceramic materials to manufacture various high-temperature components and functional components.

1. Silicon carbide-hafnium silicide-tantalum silicide (SiC-HfSi2-TaSi2) anti-ablation preparation composite coating. Carbon fiber reinforced carbon (C/C) composite material is a new type of high temperature resistant composite material with carbon fiber as the reinforcement and pyrolytic carbon as the matrix. Due to its excellent high-temperature strength, ablation resistance and good friction and wear properties, the United States carried out research work on C/C composite materials for thermal structures in the early 1970s, turning C/C composite materials from combustion and heating to Thermal structure. Heat-resistant materials need to develop thermal structural materials. C/C composite materials can be used as thermal structural materials such as gas turbine structural parts, space shuttle nose cone caps, and leading edges of wings. Most of these parts work in high temperature and oxidizing environments.

However, C/C composite materials are easy to oxidize and generally cannot be used in an oxidizing atmosphere higher than 400°C. This requires proper anti-oxidation protection for C/C composite materials, and the preparation of anti-oxidation coatings is one of the main protection measures. Studies have shown that adding refractory metals Zr, Hf, Ta, TiB2, etc. to the carbon matrix can further improve the ablation resistance of C/C composites. In order to understand the influence of metal Hf and Ta on the ablation performance of C/C composites, some experiments used the embedding method to prepare SiC-HfSi2-TaSi2 anti-ablation coatings. The anti-ablation coating is measured with an oxyacetylene ablation device. Ablation performance of the layer. Knot

2. Prepare the organic electroluminescence device. It includes an anode, a light-emitting layer, a cathode, and a packaging cover stacked in sequence. The encapsulation cover wraps the light-emitting layer and the cathode on the anode. The package cover includes a silicon carbonitride layer and a barrier layer formed on the surface of the silicon carbonitride layer. The material of the barrier layer includes silicide and metal oxide, the silicide is selected from at least one of chromium silicide, tantalum disilicide, hafnium silicide, titanium disilicide, molybdenum disilicide and tungsten disilicide, and the metal oxide is selected from At least one of magnesium oxide, aluminum oxide, titanium oxide, zirconium oxide, hafnium oxide, and tantalum pentoxide. The above-mentioned organic electroluminescence device has a long life.

3. Preparation of silicon-germanium alloy-based thermoelectric elements. The silicon-germanium alloy-based thermoelectric element is composed of an electrode layer, a silicon-germanium alloy-based thermoelectric layer, and a barrier layer between the electrode layer and the silicon-germanium alloy-based thermoelectric layer. The barrier layer is a mixture of silicide and silicon nitride, and the silicide is At least one of molybdenum silicide, tungsten silicide, cobalt silicide, nickel silicide, niobium silicide, zirconium silicide, tantalum silicide, and hafnium silicide. The provided silicon-germanium alloy-based thermoelectric element has good interface bonding, no cracks and obvious diffusion at the interface, low contact resistance, good thermal contact state, and can withstand long-term high-temperature accelerated tests.

4. Preparation of high temperature and oxidation resistant metal ceramic composite coating. The characteristic of the composite film is that the coating is composed of refractory metal, refractory carbide and intermetallic compound, and the thickness of the coating is 10 μm-50 μm. The refractory metal is one or more of molybdenum, tantalum, zirconium, and hafnium; the composition of refractory carbide is silicon carbide, and the composition of one or more intermetallic compounds of tantalum carbide, zirconium carbide, and hafnium carbide is One or more of molybdenum silicide, tantalum silicide, zirconium silicide, hafnium silicide, tantalum silicide, and zirconium silicide and hafnium silicide; the crystalline structure of the coating is composed of amorphous and/or polycrystalline nanoparticles.

Hafnium silicide HfSi2 powder price

The price of hafnium silicide HfSi2 powder will be related to the production cost, transportation cost, international situation, exchange rate and random changes in supply and demand. Tanki New Materials Co., Ltd. aims to help various industries and chemical wholesalers find high-quality, low-cost nanomaterials and chemicals by providing a full set of customized services. If you are looking for hafnium silicide HfSi2 powder, please feel free to send an inquiry to get the latest price of hafnium silicide HfSi2 powder.

Hafnium silicide HfSi2 powder supplier

As a global hafnium silicide HfSi2 powder supplier, Tanki New Materials Co., Ltd. has extensive experience in the performance, application and cost-effective manufacturing of advanced engineering materials. The company has successfully developed a series of powder materials (molybdenum disilicide, titanium silicide, calcium silicide, iron boride), high-purity targets, functional ceramics and structural devices, and provides OEM services