Production method and application of titanium silicide Ti5Si3 powder

Overview of titanium silicide Ti5Si3 powder

Ti5Si3 has good high-temperature stability, high-temperature strength and good oxidation resistance, and is expected to be used in high-temperature structural materials above 1300°C. In addition, because Ti5Si3 has low resistance and high heat resistance, it is also expected to be used as a sintering raw material. Ti5Si3 powder is prepared by weighing the molar ratio of Si powder and Ti powder to 3:5, and Ti5Si3 compound is synthesized through a vacuum sintering process. The sintering process is as follows: heat the mixture of silicon powder and titanium powder in a vacuum furnace to 1350～1450℃, keep it warm, cool the furnace to room temperature, add the sintered product to absolute ethanol, and then put it into the ball milling tank, using AR gas as Protective gas.

Preparation method of titanium silicide Ti5Si3 powder

Generally, the preparation methods of Ti5Si3 include casting method, powder sintering method, rapid solidification method, self-propagating combustion method and so on. However, these methods are easy to cause pollution, the processing technology is complicated, the yield is low, and the effect is limited.

1. The present invention relates to a batch preparation method of trisilicate pentatitanium intermetallic powder, which is characterized by the following steps:

(1) Weigh the molar ratio of Si powder to Ti powder to synthesize Ti5Si3 compound by vacuum sintering method. 3:5;

(2) The sintering process used in step (1) is: the uniformly mixed Si powder and Ti powder are placed in a vacuum furnace, heated to 1350 to 1450 ℃, kept warm, and cooled to room temperature along with the furnace;

(3) Add the sintered material obtained in step (2) to absolute ethanol and put it into a ball mill tank. The sealed ball mill tank is put into a high-energy planetary ball mill using AR gas as the protective gas, and refined by wet ball milling.

(4) Vacuum dry and grind the ball mill slurry obtained in step (3), and pass through a 130-mesh sieve to obtain Ti5Si3 powder.

2. The batch preparation method of trisilicate intermetallic compound powder according to claim 1, characterized in that the vacuum degree of the vacuum furnace in the step (2) is less than 1.0×10-2Pa.

3. A batch preparation method of trisilicate intermetallic compound powder according to claim 1, characterized in that: in the step (2), the temperature is increased to 1350 to 1450°C at a rate of 20°C. ℃/min, heat preservation for 3-5 hours.

4. The batch preparation method of trisilicate intermetallic compound powder according to claim 1, characterized in that in the step (3), the rotation speed of the planetary ball mill is 300-500 rpm, and the ball milling time is 24 -48 hours.

The method overcomes the defects of fusion casting method, powder pressing and sintering method, rapid solidification method and self-diffusion combustion method, which are easy to cause pollution, complex processing technology, and low yield. The reaction process has no by-products, high powder purity, can accurately control the stoichiometric ratio of the product, low energy consumption, fine product particle size, uniform distribution, high activity, batch preparation, no pollution, low cost and reduction.

Application of titanium silicide Ti5Si3 powder

Titanium silicide (Ti5Si3) is widely used in metal oxide semiconductor manufacturing (MOS), metal oxide semiconductor field effect transistors (MOSFET) and dynamic random access memory (DRAM) gate, source/drain, interconnection and ohmic touch.

The application examples of titanium silicide Ti5Si3 are as follows

1) Preparation of a titanium silicide barrier layer. The device using the method for manufacturing the titanium silicide barrier layer includes a non-silicide region and a silicide region separated by isolation regions, and the upper surface of the device is covered with a sacrificial oxide layer. The present invention includes : Adopt photolithography process to cover the non-silicide area with photoresist and expose the silicide area; use wet etching process to etch away the sacrificial oxide layer in the silicide area; amorphize the exposed silicon in the silicide area , As implantation; removal of the photoresist remaining in the non-silicide area; sputtering titanium metal for the first alloying treatment; wet etching to remove the unalloyed titanium metal for the second alloying treatment. The present invention deletes the silicideblock oxide layer in the prior art and reduces the process cost; at the same time, it reduces the loss of the isolation oxide film by etching and improves the process stability.

2) Prepare an in-situ synthesized titanium silicide (Ti5Si3) particle reinforced aluminum titanium carbide (Ti3AlC2)-based composite material. By adding a certain amount of silicon, Ti3AlC2/Ti5Si3 composites with different volume ratios were prepared, in which the volume percentage of the titanium silicide particle reinforcement phase was 10-40%. The specific preparation method is as follows: First, using titanium powder, aluminum powder, silicon powder and graphite powder as raw materials, the molar ratio of Ti:Al:Si:C is 3:(1.1-x):x:(1.8~2.0), where x is 0.1~0.5. The raw material powder is mixed by physical and mechanical methods for 8~24 hours, put into a graphite mold, the applied pressure is 10~20MPa, and it is sintered in a hot pressing furnace with protective atmosphere, the heating rate is 10~50℃/min, and the sintering temperature The temperature is 1400~1600℃, the sintering time is 0.5~2 hours, and the sintering pressure is 20-40MPa. The invention can prepare the aluminum titanium carbide/titanium silicide composite material with high purity and high strength at a lower temperature and a shorter time.

3) Preparation of composite functional titanium silicide coated glass. Deposit a layer of thin film on the ordinary float glass substrate or deposit a layer of silicon thin film between them. By preparing a composite film of titanium silicide and silicon or adding a small amount of active carbon or nitrogen into the film to obtain a composite film of titanium silicide composite silicon carbide or titanium carbide or titanium silicide composite silicon nitride or titanium nitride, the The mechanical strength and chemical resistance of coated glass are improved. The present invention is a new type of coated glass that combines the functions of dimming, heat insulation and low-emissivity glass.

4) Preparation of a semiconductor element, including a silicon substrate, a gate, source and drain are formed on the silicon substrate, an insulating layer is formed between the gate and the silicon substrate, and the gate is located on the insulating layer It consists of a polysilicon layer and a titanium silicide layer on the polysilicon layer. A protective layer is formed on the titanium silicide layer. The protective layer, the titanium silicide layer, the polysilicon layer and the insulating layer are surrounded by three structural layers, which are nitrogen in order from the inside to the outside. The silicon spacer layer, the affinity layer and the silicon oxide spacer layer, a titanium silicide layer is formed on the source and drain electrodes, an inner dielectric layer is formed on the silicon substrate, and contact window openings are formed in the inner dielectric layer . By adopting the above technical scheme, the utility model can make the grid and the wire in the contact window be completely insulated without short circuit.

Titanium silicide Ti5Si3 powder price

The price of titanium silicide Ti5Si3 powder products varies randomly with factors such as production costs, transportation costs, international situations, exchange rates, and the supply and demand relationship of titanium silicide Ti5Si3 powder products. Tanki New Materials Co., Ltd. aims to help various industries and chemical wholesalers find high-quality, low-cost nanomaterials and chemicals by providing a full set of customized services. If you are looking for titanium silicide Ti5Si3 powder product materials, please feel free to contact for the latest price of titanium silicide Ti5Si3 powder.

Titanium silicide Ti5Si3 powder supplier

As a global titanium silicide Ti5Si3 powder supplier, Tanki New Materials Co., Ltd. has extensive experience in the performance, application and cost-effective manufacturing of advanced and engineered materials. The company has successfully developed a series of powder materials (molybdenum disilicide, titanium silicide, calcium silicide, iron boride), high-purity targets, functional ceramics and structural devices, and provides OEM services.